Title:
ガス供給装置及び熱処理装置
Document Type and Number:
Japanese Patent JP5761067
Kind Code:
B2
Abstract:
Provided is a gas supply apparatus having a source gas supply system configured to supply a source gas to a processing container using a carrier gas, wherein the source gas is generated from a liquid raw material consisting of an organic metal material. The gas supply apparatus includes a raw material storage tank configured to store the liquid raw material therein; a gas supply portion installed to the raw material storage tank and connected to a carrier gas passage, wherein the carrier gas passage allows the carrier gas to flow; a gas outflow portion installed to the raw material storage tank and connected to a source gas passage, wherein the source gas passage allows the source gas to flow; and a baffle plate configured to prevent the carrier gas injected from the gas supply portion from being brought into direct contact with a liquid surface of the raw material.
Inventors:
Wamura Yu
Yusuke Tateno
Hiromi Shima
Yusuke Tateno
Hiromi Shima
Application Number:
JP2012028494A
Publication Date:
August 12, 2015
Filing Date:
February 13, 2012
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/31; C23C16/448; H01L21/314; H01L21/316
Domestic Patent References:
| JP2007501536A | ||||
| JP2011042876A | ||||
| JP2006161162A | ||||
| JP2009267388A | ||||
| JP1109713A | ||||
| JP1236934A |
Attorney, Agent or Firm:
Akihiro Asai