Title:
パターン形成方法
Document Type and Number:
Japanese Patent JP5764102
Kind Code:
B2
Abstract:
According to the embodiments, a method for pattern formation includes: creating a first self-assembly material layer which contains a first segment and a second segment, on a substrate on which a guide layer is installed; creating a first self-assembled pattern in which the first self-assembly material layer is phase-separated, the pattern including a first area containing the first segment and a second area containing the second segment; creating a second self-assembly material layer which includes a third segment and a fourth segment, in the first self-assembled pattern; creating a second self-assembled pattern in which the second self-assembly material layer is phase-separated, and which includes a third area containing the third segment and a fourth area containing the fourth segment.
Inventors:
Ayako Kawanishi
Toshi Tsuji
Toshi Tsuji
Application Number:
JP2012194960A
Publication Date:
August 12, 2015
Filing Date:
September 05, 2012
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
H01L21/3205; H01L21/027; H01L21/768
Domestic Patent References:
| JP2011126000A | ||||
| JP2011233210A | ||||
| JP2012078828A | ||||
| JP2012033534A |
Attorney, Agent or Firm:
Hirohito Katsunuma
Yasukazu Sato
Yasushi Kawasaki
Takeshi Sekine
Akaoka Akira
Takayuki Shigeno
Yasukazu Sato
Yasushi Kawasaki
Takeshi Sekine
Akaoka Akira
Takayuki Shigeno