Title:
レジスト組成物、レジストパターン形成方法
Document Type and Number:
Japanese Patent JP5779456
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition excellent in a lithography characteristic and pattern shape, and a method for forming a resist pattern.SOLUTION: The resist composition contains a base component (A) which generates an acid by exposure and whose dissolubility to a developer liquid changes by action of the acid. The component (A) contains a structural unit (a0-1) represented by the formula (a0-1), and a resin component (A1) having a structural unit (a0-2) that generates acid by exposure. In the formula, R represents a hydrogen atom, 1-5C alkyl group, or 1-5C alkyl halide, and Rrepresents a divalent linking group.
Inventors:
Kensuke Matsuzawa
Atsushi Iwashita
Atsushi Iwashita
Application Number:
JP2011199671A
Publication Date:
September 16, 2015
Filing Date:
September 13, 2011
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/039; G03F7/004
Domestic Patent References:
| JP2011158879A | ||||
| JP5518671B2 | ||||
| JP2003122010A | ||||
| JP2005196209A |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi