Title:
屈曲構造及び／又は分岐構造を持つシリカ二次粒子を含有するコロイダルシリカ及びその製造方法
Document Type and Number:
Japanese Patent JP5808106
Kind Code:
B2
Abstract:
This invention provides a dense, high-purity colloidal silica containing silica secondary particles having a branched and/or bent structure, and a production method thereof. Specifically, this invention provides a method for producing a colloidal silica, comprising the steps of 1) preparing a mother liquid containing an alkali catalyst and water, and having a pH of 9 to 12; and 2) adding a hydrolysis liquid obtained by hydrolysis of an alkyl silicate to the mother liquid, wherein the step of adding the hydrolysis liquid to the mother liquid sequentially comprises A) step 1 of adding the hydrolysis liquid until the pH of the resulting liquid mixture becomes less than 7; B) step 2 of adding an aqueous alkali solution until the pH of the liquid mixture becomes 7 or more; and C) step 3 of adding the hydrolysis liquid while maintaining the pH of the liquid mixture at 7 or more, and a colloidal silica containing silica secondary particles having a branched and/or bent structure, obtained by this method.
Inventors:
Kazuaki Higuchi
Etsuki Otsuki
Etsuki Otsuki
Application Number:
JP2010530800A
Publication Date:
November 10, 2015
Filing Date:
September 01, 2009
Export Citation:
Assignee:
Fuso Chemical Industry Co., Ltd.
International Classes:
C01B33/141; C09K3/14; H01L21/304
Domestic Patent References:
| JPH02196015A | 1990-08-02 | |||
| JP2000226453A | 2000-08-15 | |||
| JPS61117113A | 1986-06-04 | |||
| JP2000001309A | 2000-01-07 | |||
| JP2003226515A | 2003-08-12 |
Foreign References:
| WO2006011252A1 | 2006-02-02 |
Other References:
JPN6014015022; Ａ．Ｋ．ＶＡＮ ＨＥＬＤＥＮ ｅｔ．ａｌ: 'Ｐｒｅｐａｒａｔｉｏｎ ａｎｄ Ｃｈａｒａｃｔｅｒｉｚａｔｉｏｎ ｏｆ Ｓｐｈｅｒｉｃａｌ Ｍｏｎｏｄｉｓｐａｅｒｓｅ Ｓｉｌｉｃａ Ｄｉｓｐａｅｒｓｉｏｎｓ ｉｎ Ｎｏｎａｑｕｅｏｕｓ Ｓｏｌｖｅｎ' Ｊｏｕｒｎａｌ ｏｆ ｃｏｌｌｏｉｄ ａｎｄ ｉｎｔｅｒｆａｃｅ Ｓｃｉｅｎｃｅ Ｖｏｌ．８１，Ｎｏ．２, 1981, ｐ３５４-３６８
Attorney, Agent or Firm:
Patent Business Corporation Saegusa International Patent Office