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Title:
芳香族ポリアセタールおよびそれを含む物品
Document Type and Number:
Japanese Patent JP5813832
Kind Code:
B2
Abstract:
A polymer includes repeat units having the structure wherein R1, R2, Ar1, Ar2, and Ar3 are defined herein. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists.

Inventors:
Matthias S Over
Duane are romer
John B. Etienne
Puricottil Jay Thomas
Application Number:
JP2014144250A
Publication Date:
November 17, 2015
Filing Date:
July 14, 2014
Export Citation:
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Assignee:
Dow Global Technologies LLC
International Classes:
C08G61/12
Domestic Patent References:
JP2003140351A
JP2010113142A
JP2013133359A
Foreign References:
US7524923
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office