Title:
感光性樹脂組成物、これを用いたパターンの製造方法
Document Type and Number:
Japanese Patent JP5814143
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in rectangularity, sensitivity, PED, resolution and residual film property, a method for producing a pattern, an organic EL display device, a method for manufacturing a liquid crystal display device, and a cured film.SOLUTION: A photosensitive resin composition comprises: (A1) a polymer having a repeating unit (a1) in which a hydroxyl group of hydroxystyrene is protected with a vinyl ether compound and a hydroxystyrene repeating unit (a2) having a hydrogen atom or a methyl group at an α-position; (A2) a polymer having a repeating unit (a3) in which a hydroxyl group of hydroxystyrene is protected with a furan derivative and the repeating unit (a2); (B) a parahydroxystyrene resin having 2000 to 15000 weight average molecular weight and 1.5 to 5.0 polydispersity; (C) a photoacid generator; (D) a base compound; and (E) a solvent.
Inventors:
Susumu Fujimoto
Hideyuki Nakamura
Hideyuki Nakamura
Application Number:
JP2012016508A
Publication Date:
November 17, 2015
Filing Date:
January 30, 2012
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/039; C08F212/14; G03F7/004; H01L51/50; H05B33/12; H05B33/22
Domestic Patent References:
| JP9241234A | ||||
| JP2005187084A | ||||
| JP2011209692A |
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes