多結晶シリコン洗浄装置 - Mitsubishi Materials Corporation

Title:

多結晶シリコン洗浄装置

Document Type and Number:

Japanese Patent JP5817424

Kind Code:

B2

More Like This:

JPH0697657	INDUSTRIAL APPLICABILITY: Amorphous thin film forming apparatus
JPS5987078	[Title of the device] The attachment-and-detachment mechanism of an amorphous silicon photoconductive drum
WO/1993/001131	PROCESS AND DEVICE FOR THE CONTINUOUS TREATMENT OF SILICON

Inventors:

Mizoguchi Tsuneo
Kazuto Igaki
Yukazu Miyata

Application Number:

JP2011229023A

Publication Date:

November 18, 2015

Filing Date:

October 18, 2011

Export Citation:

Assignee:

Mitsubishi Materials Corporation

International Classes:

C01B33/02; B08B3/04

Domestic Patent References:

Attorney, Agent or Firm:

Masakazu Aoyama

Previous Patent: 画像形成装置

Next Patent: JPS5817425