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Title:
マグネシウムビス(ジアルキルアミド)化合物、及び当該マグネシウム化合物を用いるマグネシウム含有薄膜の製造方法
Document Type and Number:
Japanese Patent JP5817727
Kind Code:
B2
Abstract:
The present invention relates to: a magnesium bis(dialkylamide) compound represented by general formula (1) (wherein R1 represents an isopropyl group, or a branched alkyl group having 4-6 carbon atoms; and R2 represents a linear or branched alkyl group having 1-5 carbon atoms; wherein a case in which each of R1 and R2 represents an isopropyl group, a case in which each of R1 and R2 represents an isobutyl group and a case in which R1 represents an isopropyl group and R2 represents a methyl group are excluded); and a process for producing a magnesium-containing thin film using the magnesium compound.

Inventors:
Fujimura Sei
Hiroki Kanto
Application Number:
JP2012527770A
Publication Date:
November 18, 2015
Filing Date:
August 04, 2011
Export Citation:
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Assignee:
Ube Industries,Ltd.
International Classes:
C07F3/02; C23C16/40
Domestic Patent References:
JP2005126334A2005-05-19
JP2009536267A2009-10-08
JPS63238086A1988-10-04
Foreign References:
US5892083A1999-04-06
WO2008039960A12008-04-03
DE10061317B
Other References:
JPN6015014524; J. Org. Chem. Vol.43, No.8, 1564-1566
JPN6015014531; Eur. J. Org. Chem. , 2009, 1781-1795
Attorney, Agent or Firm:
Katsuhiro Ito
Akiko Ono