Title:
マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
Document Type and Number:
Japanese Patent JP5826566
Kind Code:
B2
Abstract:
In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a writing processing control unit configured to control writing processing so that a plurality of beams having passed through different openings among the plurality of openings are arranged to align on the target object; and a shot interval adjusting unit configured to adjust shot intervals among beams so that a maximum shot interval among beams being a control grid interval defined by a predetermined quantization size or a size which is prescribed within a predetermined range from the predetermined quantization size, or less when the shot intervals among beams which are arranged to align on the target object are different depending on a place.
Inventors:
Ryoichi Yoshikawa
Munehiro Ogasawara
Munehiro Ogasawara
Application Number:
JP2011190958A
Publication Date:
December 02, 2015
Filing Date:
September 01, 2011
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01L21/027; G03F7/20; H01J37/305
Domestic Patent References:
| JP63269521A | ||||
| JP2007208038A | ||||
| JP2008252095A | ||||
| JP2009532887A |
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Mitsuyuki Matsuyama
Akira Sudo
Mitsuyuki Matsuyama