Title:
偏光解析システム
Document Type and Number:
Japanese Patent JP5827507
Kind Code:
B2
Inventors:
Abraham Jay Sens
Toyohiko Yatagaki
Toyohiko Yatagaki
Application Number:
JP2011154241A
Publication Date:
December 02, 2015
Filing Date:
July 12, 2011
Export Citation:
Assignee:
Utsunomiya University
International Classes:
G01N21/17; G01J4/04; G01N21/21; G02B5/30
Domestic Patent References:
| JP2007298461A | ||||
| JP2008538612A | ||||
| JP2003149049A | ||||
| JP2002520589A |
Foreign References:
| US20050259907 | ||||
| WO2011016437A1 | ||||
| US20020186373 | ||||
| US7061613 |
Other References:
MURO K ET AL.,Poly-Si/SiO2 Laminated Walk-Off Polarizer Having a Beam-Splitting Angle of More Than 20,OURNAL OF LIGHTWAVE TECHNOLOGY,1998年 1月,Vol.16, No.1,P.127-133
SHIRAISHI K ET AL,'Fabrication of spatial walk-off polarizing film exhibiting a large split angle by oblique silicon deposition',OPTICS LETTERS,1998年 8月 1日,vol. 23, no. 15,P.1232-1234
SHIRAISHI K ET AL,'Fabrication of spatial walk-off polarizing film exhibiting a large split angle by oblique silicon deposition',OPTICS LETTERS,1998年 8月 1日,vol. 23, no. 15,P.1232-1234
Attorney, Agent or Firm:
Shunichi Yoshimura