Title:
基板処理装置
Document Type and Number:
Japanese Patent JP5829458
Kind Code:
B2
Abstract:
A substrate treating apparatus for immersing substrates in a treating liquid. An inner tank stores the treating liquid, an outer tank collects the treating liquid overflowing the inner tank, and a lifter moves the substrates between a standby position above the inner tank and a treating position inside the inner tank. Circulation piping connects the inner tank and the outer tank. The treating liquid overflows the inner tank into the outer tank in a treating state with the lifter and the substrates located in the treating position. The treating liquid remains in the inner tank without overflowing in a non-treating state with the lifter and the substrates located in the standby position. The treating liquid flows from the inner tank to the outer tank through the circulating piping in a non-treating circulation state before the lifter moves the substrates to the treating position.
Inventors:
Naoji Maekawa
Application Number:
JP2011183696A
Publication Date:
December 09, 2015
Filing Date:
August 25, 2011
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/304; B65G49/02; H01L21/306
Domestic Patent References:
| JP2006202811A | ||||
| JP2000098313A |
Attorney, Agent or Firm:
Tsutomu Sugiya
Hiroyuki Todaka
Hiroyuki Todaka
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