Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
マグネトロンスパッタリング用磁場発生装置
Document Type and Number:
Japanese Patent JP5835235
Kind Code:
B2
Abstract:
A racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering comprising a linear portion and corner portions, the linear portion comprising a magnetic base, a center permanent magnet disposed on its surface, and side permanent magnets disposed on both sides thereof with a gap; the center and side permanent magnets being vertically magnetized with opposite polarities; the corner portions comprising a non-magnetic base, a center magnetic pole member disposed on its surface, a semicircular or semi-polygonal, peripheral magnetic pole member, and plural permanent magnets arranged between both magnetic pole members with their magnetization directions in parallel to a target surface; and the magnetic poles of plural permanent magnets opposing the center magnetic pole member having the same polarity as those of the center permanent magnet opposing the target.

Inventors:
Yoshihiko Kuriyama
Masahiro Mita
Application Number:
JP2012554716A
Publication Date:
December 24, 2015
Filing Date:
January 12, 2012
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Hitachi Metals Co., Ltd.
International Classes:
C23C14/35
Domestic Patent References:
JP2008156735A
JP2009127109A
JP200616634A
JP11510563A
JP967668A
JP60116774A
JP57188679A
JP1177370A
JP6207271A
Attorney, Agent or Firm:
Takaishi Tachibana