Title:
相分離構造を有する層を表面に備える基板の製造方法
Document Type and Number:
Japanese Patent JP5846568
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method of forming the phase separation structure of a block copolymer into the shape of a lamellar structure which is oriented in a direction vertical to a substrate surface by adjusting a thin film pattern comprising a surface treatment agent.SOLUTION: A method of manufacturing the substrate includes steps of: forming an neutralization film containing the surface preparation agent on the substrate; forming a mask pattern comprising resist on the neutralization film; transferring the mask pattern on the neutralization film, removing the mask pattern from the neutralization film, forming a layer containing a block copolymer obtained by bonding a plurality of kinds of polymers with one another to cover the neutralization film and then, heating the layer containing the block copolymer to perform phase separation. The surface preparation agent has an affinity with every polymers constituting the block copolymer. The mask pattern is an L/S pattern in which the width of the line and the interval of the space is 0.5 times or 1-10 integral multiple of period of the block copolymer. The substrate has the phase separation structure on the surface thereof.
Inventors:
Masaki Saki
Ken Miyagi
Shigenori Fujikawa
Harumi Hayakawa
Ken Miyagi
Shigenori Fujikawa
Harumi Hayakawa
Application Number:
JP2011089091A
Publication Date:
January 20, 2016
Filing Date:
April 13, 2011
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
RIKEN
RIKEN
International Classes:
H01L21/027; C08J7/04
Domestic Patent References:
| JP2010056256A | ||||
| JP2010056257A | ||||
| JP2010144120A |
Foreign References:
| US20090179002 |
Other References:
Sang Ouk Kim, et al.,"Eptaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates",nature,2003年 7月24日,vol.424,pp.411-414
Joy Y. Cheng, et al.,"Dence Self-Assembly on Sparse Chemical Patterns:Rectifying and Multiplying Lithographic Patterns Using Block Copolymers",ADVANCED MATERIALS,2008年,vol.20,pp.3155-3158
Joy Y. Cheng, et al.,"Dence Self-Assembly on Sparse Chemical Patterns:Rectifying and Multiplying Lithographic Patterns Using Block Copolymers",ADVANCED MATERIALS,2008年,vol.20,pp.3155-3158
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi