Title:
基板処理装置及びガス供給装置
Document Type and Number:
Japanese Patent JP5862529
Kind Code:
B2
Abstract:
The gas supply unit includes first gas flow paths having an upstream side communicated with a common first gas supply hole and diverged on the way to have a downstream side, and second gas flow paths having an upstream side communicated with a common second gas supply hole and diverged on the way to have a downstream side. A flow path length and a flow path diameter of each of the diverged first gas flow paths and the diverged second gas flow paths are set such that periods of time for gas flowing from the first gas supply hole to the respective first gas ejecting holes are matched with each other, and periods of time for gas flowing from the second gas supply hole to the respective second gas ejecting holes are matched with each other.
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Inventors:
Shoji Itonaga
Yohei Sano
Yohei Sano
Application Number:
JP2012211271A
Publication Date:
February 16, 2016
Filing Date:
September 25, 2012
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027
Domestic Patent References:
| JP2004079904A | ||||
| JP2008516084A | ||||
| JP11158662A | ||||
| JP2005019969A | ||||
| JP2000294538A | ||||
| JP2011134871A | ||||
| JP2002075692A |
Foreign References:
| US5595606 | ||||
| US20030070761 | ||||
| US20060237127 | ||||
| WO2007026889A1 |
Attorney, Agent or Firm:
Toshio Inoue
Tomoaki Miida
Tomoaki Miida