Title:
マイクロリソグラフィ投影露光装置の投影対物レンズ
Document Type and Number:
Japanese Patent JP5863974
Kind Code:
B2
Abstract:
A projection objective of a microlithographic projection exposure apparatus includes a wavefront correction device including a refractive optical element that has two opposite optical surfaces, through which projection light passes, and a circumferential rim surface extending between the two optical surfaces. A first and a second optical system are configured to direct first and second heating light to different portions of the rim surface such that at least a portion of the first and second heating light enters the refractive optical element. A temperature distribution caused by a partial absorption of the heating light results in a refractive index distribution inside the refractive optical element that corrects a wavefront error. At least the first optical system includes a focusing optical element that focuses the first heating light in a focal area such that the first heating light emerging from the focal area impinges on the rim surface.
More Like This:
Inventors:
Johannes Zerner
Boris Bitner
Norbert wobbler
Martin von Hardenberg
Sonya schneider
Ricarda Schneider
Arnesov
Gunther Rudolph
Alexander Grazke
Bryce Anton Moffat
Boris Bitner
Norbert wobbler
Martin von Hardenberg
Sonya schneider
Ricarda Schneider
Arnesov
Gunther Rudolph
Alexander Grazke
Bryce Anton Moffat
Application Number:
JP2014532251A
Publication Date:
February 17, 2016
Filing Date:
September 29, 2011
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2010267966A | ||||
| JP2001196305A | ||||
| JP2006319098A | ||||
| JP2008060560A | ||||
| JP2001114528A | ||||
| JP2011520240A | ||||
| JP2011013687A |
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi
Tsubouchi Shin
Groundwork Kenichi
Tsubouchi Shin