Title:
オリゴシラン又はポリシランを形成する方法、及び、半導体フィルムを形成する方法
Document Type and Number:
Japanese Patent JP5881225
Kind Code:
B2
Abstract:
Compositions and methods for controlled polymerization and/or oligomerization of silane (and optionally cyclosilane) compounds, including those of the general formulae SinH2n and SinH2n+2, as well as halosilanes and arylsilanes, to produce soluble polysilanes, polygermanes and/or polysilagermanes having low levels of carbon and metal contaminants, high molecular weights, low volatility, high purity, high solubility and/or high viscosity. The polysilanes, polygermanes and/or polysilagermanes are useful as a precursor to silicon- and/or germanium-containing conductor, semiconductor and dielectric films.
Inventors:
Kunze, Claus
Nice, Gregory
Guo, Wen Joo
Nice, Gregory
Guo, Wen Joo
Application Number:
JP2014522805A
Publication Date:
March 09, 2016
Filing Date:
August 01, 2011
Export Citation:
Assignee:
Shin Film Electronics ASA
International Classes:
C01B33/04; C08G77/00; C08G79/00; C09D11/00
Domestic Patent References:
| JP6246164A | ||||
| JP5032785A | ||||
| JP62241926A | ||||
| JP2010526445A |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation