Title:
冷却式シャワーヘッド及びそれを具備する基板処理装置
Document Type and Number:
Japanese Patent JP5882499
Kind Code:
B2
Abstract:
Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having an opened upper side, the chamber body providing an inner space in which processes with respect to a substrate are performed, a chamber lid disposed on an upper portion of the chamber body to close the opened upper side of the chamber body, and a showerhead disposed on a lower portion of the chamber lid to supply a reaction gas into the inner space. The showerhead includes a flange contacting the chamber lid, the flange having a passage recessed from a top surface of the flange to allow a refrigerant to flow therein, and a flat plate disposed inside the flange, the flat plate having at least one injection hole for injecting the reaction gas in a thickness direction thereof.
More Like This:
Inventors:
Yan, Il-Kwan
Song, Byung-kyu
Kim, Yeon-ki
Kim, Kyun-Hoon
Shin, Yang-Sik
Song, Byung-kyu
Kim, Yeon-ki
Kim, Kyun-Hoon
Shin, Yang-Sik
Application Number:
JP2014548651A
Publication Date:
March 09, 2016
Filing Date:
November 23, 2012
Export Citation:
Assignee:
Yu-Gen Technology Company Limited
International Classes:
H01L21/205; C23C16/455
Domestic Patent References:
| JP9186109A | ||||
| JP7321054A | ||||
| JP7058101A | ||||
| JP2004076023A | ||||
| JP2009302205A | ||||
| JP2002158179A |
Foreign References:
| US20090071403 |
Attorney, Agent or Firm:
Masaaki Ogura