リソグラフィ装置およびリソグラフィ方法

Title:

リソグラフィ装置およびリソグラフィ方法

Document Type and Number:

Japanese Patent JP5886279

Kind Code:

B2

Abstract:

A lithographic apparatus includes a radiation source configured to produce a radiation beam. The lithographic apparatus also includes a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. The support is provided with a pellicle which comprises a layer of graphene.

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Inventors:

Andrey Yakunin
Banier, Badim
Lurop stra, eric
Van der Schoat, Helmen
Stevens, Lucas
Ban Kampen, Marten

Application Number:

JP2013515778A

Publication Date:

March 16, 2016

Filing Date:

March 17, 2011

Export Citation:

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