Title:
マイクロリソグラフィ用の照明光学系
Document Type and Number:
Japanese Patent JP5888622
Kind Code:
B2
Abstract:
An illumination optics for microlithography includes an optical assembly for guiding illumination light to an object field to be illuminated in an object plane. The illumination optics can divide an illumination light radiation bundle into a plurality of radiation sub-bundles which are assigned to different illumination angles of the object field illumination. The illumination optics is configured so that at least some of the radiation sub-bundles are superimposed in a superposition plane which is spaced from the object plane and which is not imaged into the object plane in which superposition takes place. This superposition is such that edges of the superimposed radiation sub-bundles coincide at least partially. In some embodiments, a field intensity setting device includes a plurality of adjacent individual diaphragms which at least attenuate illumination light when exposed thereon. These individual diaphragms are insertable into an illumination light radiation bundle in a direction parallel to an object displacement direction. All individual diaphragms of the field intensity setting device are insertable into the illumination light radiation bundle from one and the same side.
Inventors:
Entres Martin
Stutz Ralph
Ottoman Jens
Stutz Ralph
Ottoman Jens
Application Number:
JP2014102463A
Publication Date:
March 22, 2016
Filing Date:
May 16, 2014
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2007287817A | ||||
| JP2003309057A | ||||
| JP2004128449A | ||||
| JP2005524236A | ||||
| JP2006191067A | ||||
| JP2005196180A | ||||
| JP2002110529A | ||||
| JP10039227A | ||||
| JP2006253487A | ||||
| JP2002319536A | ||||
| JP2007288188A | ||||
| JP2003178969A | ||||
| JP7230949A |
Foreign References:
| WO2005040927A2 | ||||
| US6476905 | ||||
| US20060244941 |
Other References:
G. ZHANG,ILLUMINATION PUPIL FILL MEASUREMENT AND ANALYSIS AND ITS APPLICATION 以下備考,PROCEEDINGS OF SPIE,OPTICAL MICROLITHOGRAPHY XVI,2003年,V5040,P45-56,IN SCANNER V-H BIAS CHARACTERIZATION FOR 130NM NODE AND BEYOND
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo