Title:
銅の相互接続体のための窒化コバルト層及びそれらを形成する方法
Document Type and Number:
Japanese Patent JP5890463
Kind Code:
B2
Abstract:
The application discloses CVD of thin films employing amidinate complexes of the metals lithium, sodium, potassium, beryllium, calcium, strontium, barium, scandium, yttrium, lanthanum and the other lanthanide metals, titanium, zirconium, hafnium, vanadium, niobium, tantalum, molybdenum, tungsten, manganese, rhenium, iron, ruthenium, cobalt, rhodium, nickel, palladium, silver, Zinc, cadmium, tin, lead, antimony and bismuth as precursor. A novel cobalt precursor is also disclosed.
Inventors:
Gordon, Roy Gerald
Bandari, Harishby.
Kim
Bandari, Harishby.
Kim
Application Number:
JP2014092724A
Publication Date:
March 22, 2016
Filing Date:
April 28, 2014
Export Citation:
Assignee:
PRESIDENT AND FELLOWS OFHARVARD COLLEGE
International Classes:
H01L21/28; H01L21/285; H01L21/3205; H01L21/768; H01L23/532
Domestic Patent References:
| JP2006511716A |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Atsushi Ebiya
Shunsuke Mima
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Atsushi Ebiya
Shunsuke Mima