Title:
ジアリル基含有ヒドロキシフェニル誘導体、シリコーン骨格含有高分子化合物、ネガ型レジスト材料、光硬化性ドライフィルム、パターン形成方法及び電気・電子部品保護用皮膜
Document Type and Number:
Japanese Patent JP5900318
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a silicone polymer having excellent resist suitability.SOLUTION: A silicone skeleton-containing polymer compound has repeating units represented by general formula (1) and has a weight average molecular weight of 3,000-500,000, where X is a bisphenol compound residue, Y is a bisphenol glycidyl ether compound residue, and W is a triphenyl dihydroxy compound residue.
Inventors:
Katsuya Takemura
Hiroyuki Urano
Takashi Miyazaki
Satoshi Asai
Nakajima Giant
Hiroyuki Urano
Takashi Miyazaki
Satoshi Asai
Nakajima Giant
Application Number:
JP2012279348A
Publication Date:
April 06, 2016
Filing Date:
December 21, 2012
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08G77/52; C07C39/21; C08G59/02; G03F7/004; G03F7/038; G03F7/075; G03F7/40; H01L21/027
Domestic Patent References:
| JP8176409A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa