Title:
樹脂、レジスト組成物及びレジストパターン製造方法
Document Type and Number:
Japanese Patent JP5903833
Kind Code:
B2
Abstract:
The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents *-X2—, *-X2—X4—CO—X3—, or *-X2—CO—X4—X3—, X2 and X3 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rc)—, * represents a binding position to X1, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
Inventors:
Koji Ichikawa
Masahiko Shimada
Takashi Nishimura
Masahiko Shimada
Takashi Nishimura
Application Number:
JP2011238426A
Publication Date:
April 13, 2016
Filing Date:
October 31, 2011
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08F220/38; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2010164712A | ||||
| JP2010191014A | ||||
| JP2010211043A | ||||
| JP2009244859A |
Foreign References:
| WO2012033019A1 |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto