Title:
The optical modulator and illumination system of a micro lithography projection aligner
Document Type and Number:
Japanese Patent JP5918858
Kind Code:
B2
Abstract:
An illumination system of a microlithographic projection exposure apparatus comprises a light modulator which includes a modulator substrate and an array of mirrors that are supported by the modulator substrate. At least some adjacent mirrors partly overlap. The light modulator further comprises a plurality of actuators that are supported by the modulator substrate and are configured to tilt the mirrors individually.
Inventors:
Armin Velvel
Zeverin Valdis
Florian Bach
Zeverin Valdis
Florian Bach
Application Number:
JP2014541542A
Publication Date:
May 18, 2016
Filing Date:
November 15, 2011
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B5/08; G02B19/00
Domestic Patent References:
| JP2010525589A |
Foreign References:
| WO2010008552A1 |
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi
Yamato Okano
Groundwork Kenichi
Yamato Okano
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