Title:
極端紫外光生成装置
Document Type and Number:
Japanese Patent JP5921876
Kind Code:
B2
Abstract:
An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.
Inventors:
Takayuki Yabu
Koji Kakizaki
Takanobu Ishihara
Abe Tamotsu
Wakabayashi Osamu
Koji Kakizaki
Takanobu Ishihara
Abe Tamotsu
Wakabayashi Osamu
Application Number:
JP2011282189A
Publication Date:
May 24, 2016
Filing Date:
December 22, 2011
Export Citation:
Assignee:
Gigaphoton Co., Ltd.
International Classes:
H05G2/00; G03F7/20; H01L21/027
Domestic Patent References:
| JP2010123928A | ||||
| JP2007298980A | ||||
| JP10221499A | ||||
| JP2010146956A | ||||
| JP2006048978A | ||||
| JP2010080409A |
Foreign References:
| WO2010137625A1 |
Attorney, Agent or Firm:
Hosaka Enju
Masaaki Utsunomiya
Atsushi Watanabe
Mutsumi Yanase
Masaaki Utsunomiya
Atsushi Watanabe
Mutsumi Yanase