Title:
基板液処理装置及び基板液処理方法並びに基板液処理プログラムを記録したコンピュータ読み取り可能な記録媒体
Document Type and Number:
Japanese Patent JP6371716
Kind Code:
B2
Abstract:
Disclosed are a substrate liquid processing apparatus and method for performing a liquid processing on a substrate using a processing liquid, and a computer-readable recording medium with a substrate liquid processing program recorded therein. In the method, a first chemical liquid supply step is performed to supply a first chemical liquid from a first chemical liquid supply unit to a processing liquid storage unit, a first chemical liquid purifying step is performed to purify the first chemical liquid in a chemical liquid purifying unit, a second chemical liquid supply step is performed to supply a second chemical liquid from a second chemical liquid supply unit to the processing liquid storage unit, and a processing liquid supply step is performed to supply the processing liquid obtained by mixing the first and second chemical liquids from the processing liquid supply unit to substrate liquid processing units.
Inventors:
Daisuke Saiki
Mizoda Shogo
Takashi Yabuta
Jun Nonaka
Nagamatsu Tatsuya
Koji Tanaka
Maezono Yasuyasu
Mizoda Shogo
Takashi Yabuta
Jun Nonaka
Nagamatsu Tatsuya
Koji Tanaka
Maezono Yasuyasu
Application Number:
JP2015028739A
Publication Date:
August 08, 2018
Filing Date:
February 17, 2015
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/304; H01L21/306
Domestic Patent References:
| JP2010283297A | ||||
| JP2013175592A | ||||
| JP2009172459A |
Attorney, Agent or Firm:
Mihiro Uchino