Title:
構造体、光取出し膜、電子デバイス及び構造体の形成方法
Document Type and Number:
Japanese Patent JP6384668
Kind Code:
B2
Abstract:
A structure having irregularities on the surface thereof, wherein the irregularities are formed as the result of the self-organization of a polyimide or the like. The structure can be produced by a method comprising an application step of applying a composition for structure formation purposes onto a base, a leaving step of allowing the applied product to be left subsequent to the application step, and a firing step of firing the resultant product subsequent to the leaving step, wherein the composition comprises the following components (A) and (B): (A) a first polymer comprising a polyimide or a first polymer precursor comprising a polyimide precursor; and (B) a second polymer or a second polymer precursor which is different from the component (A) and/or propylene glycol monomethyl ether.
Inventors:
Taku Kato
Natsuki Sato
Yousuke Iinuma
Miki Tokutoshi
Hiroyuki Sakurai
Yukihiro Miyama
Suzuki Masayoshi
Natsuki Sato
Yousuke Iinuma
Miki Tokutoshi
Hiroyuki Sakurai
Yukihiro Miyama
Suzuki Masayoshi
Application Number:
JP2014539793A
Publication Date:
September 05, 2018
Filing Date:
October 02, 2013
Export Citation:
Assignee:
Nissan Chemical Co., Ltd.
International Classes:
C08J5/00; C08G73/10; C08L79/08; H01L33/22
Domestic Patent References:
| JP6313055A | ||||
| JP8020721A | ||||
| JP2005041936A | ||||
| JP2009013384A | ||||
| JP2012103506A |
Foreign References:
| WO2009119889A1 | ||||
| WO2013111836A1 | ||||
| WO2013099937A1 | ||||
| WO2009096204A1 |
Other References:
藤山孝太郎、外3名,ラビングによる自己組織化ナノパターンに関する研究,2004年度精密工学会春季大会学術講演会講演論文集,2004年,p.1023-1024
Attorney, Agent or Firm:
Hiroyuki Kurihara
Mountain Saki Yuichiro
Mountain Saki Yuichiro