Title:
研磨材再生方法
Document Type and Number:
Japanese Patent JP6406010
Kind Code:
B2
Abstract:
Method to obtain a highly pure reclaimed polishing material from a polishing-material slurry including already used polishing material. A polishing is reclaimed from a polishing-material slurry by undergoing: recovering in step (A) a polishing-material slurry including already used polishing material; adding in step (B) an alkali earth metal-containing metal salt to the recovered polishing-material slurry to cause the polishing material to agglomerate, and the polishing material is separated from the mother liquor and concentrated; the polishing material, having had been separated and concentrated, is subjected in step (C) to solid-liquid separation, and recovered; and using in step (D) a magnetic filter to filter and remove metal particles included in the polishing-material slurry. Step (D) is performed at the same time as step (B) or step (C), or performed after either step (A), step (B), or step (C).
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Inventors:
Yuki Nagai
Akihiro Maezawa
Chie Inui
Akihiro Maezawa
Chie Inui
Application Number:
JP2014526971A
Publication Date:
October 17, 2018
Filing Date:
July 24, 2013
Export Citation:
Assignee:
Konica Minolta Co., Ltd.
International Classes:
B24B57/02; H01L21/304
Domestic Patent References:
| JP2004290855A | ||||
| JP2009172712A | ||||
| JP2011041876A | ||||
| JP2011516290A | ||||
| JP2008188723A | ||||
| JP2002126791A | ||||
| JP3082154U |
Attorney, Agent or Firm:
Gwangyang International Patent Office