Title:
感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP6408021
Kind Code:
B2
Abstract:
This active light sensitive or radiation sensitive resin composition contains (A) an onium salt compound that contains a basic group in the cationic component, (B) an onium salt compound that generates an acid when irradiated with active light or radiation and (C) an alkali-soluble resin. The cationic component of the compound (B) has at least one group that contains an oxygen atom or a nitrogen atom.
Inventors:
Hidehiro Mochizuki
Kotaro Takahashi
Takeshi Kawabata
Hirokazu Kyoda
Kotaro Takahashi
Takeshi Kawabata
Hirokazu Kyoda
Application Number:
JP2016555185A
Publication Date:
October 17, 2018
Filing Date:
October 14, 2015
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2012013807A | ||||
| JP2013178370A | ||||
| JP2013015574A | ||||
| JP2012159688A | ||||
| JP2013064970A | ||||
| JP2012145917A | ||||
| JP2012137557A | ||||
| JP2014134686A | ||||
| JP2002372783A |
Attorney, Agent or Firm:
Kurata Masatoshi
Nobuhisa Nogawa
Naoki Kono
Tadashi Inoue
Ukai Ken
Shigeru Iino
Nobuhisa Nogawa
Naoki Kono
Tadashi Inoue
Ukai Ken
Shigeru Iino