Title:
イオンビームを制御するための装置及び方法並びにイオン注入装置
Document Type and Number:
Japanese Patent JP6421181
Kind Code:
B2
Abstract:
An apparatus to control an ion beam includes a scanner configured in an first state to scan the ion beam wherein the scanner outputs the ion beam as a diverging ion beam; a collimator configured to receive along a side of the collimator the diverging ion beam and to output the diverging ion beam as a collimated ion beam; a beam adjustment component that extends proximate the side of the collimator; and a controller configured to send a first signal when the scanner is in the first state to the beam adjustment component to adjust ion trajectories of the diverging ion beam from a first set of trajectories to a second set of trajectories.
Inventors:
Kenneth H. Parser
Christopher Campbell
Frank Sinclair
Robert Sea Lindbergh
Joseph Sea Olson
Christopher Campbell
Frank Sinclair
Robert Sea Lindbergh
Joseph Sea Olson
Application Number:
JP2016524558A
Publication Date:
November 07, 2018
Filing Date:
October 15, 2014
Export Citation:
Assignee:
Varian Semiconductor Equipment Associates, Inc.
International Classes:
H01J37/317; H01J37/147
Domestic Patent References:
| JP2009252697A | ||||
| JP2008135208A | ||||
| JP2009524197A |
Attorney, Agent or Firm:
Kenji Sugimura
Makoto Fukuo
Masaaki Ishikawa
Makoto Fukuo
Masaaki Ishikawa