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Patent Searching and Data


Title:
乾燥装置及び乾燥処理方法
Document Type and Number:
Japanese Patent JP6454470
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a dryer which efficiently eliminates a solvent in an organic material film applied to a substrate in a short time and enables uniform dry processing on a surface of the substrate, and to provide a dry processing method.SOLUTION: A dryer 100 includes: a processing container 1 which enables vacuum drawing; a placement base 3 which serves as a support member for supporting a substrate S in the processing container 1; a gas jet device 5 which jets a gas to an organic material film on the substrate S supported by the placement base 3; and a control section 6. The dryer 100 includes a pressure control mechanism for controlling a pressure in the processing container 1. Multiple nozzles 51 are formed so that a user is able to adjust a gas jet flow rate and a type of the gas for each nozzle 51.

Inventors:
Akinori Shimamura
Teruyuki Hayashi
Imada
Tetsuya Sada
Atsushi Nishiyama
Hiromi Saito
Tsukasa Daejeon
Seiichi Tanabe
Application Number:
JP2014016006A
Publication Date:
January 16, 2019
Filing Date:
January 30, 2014
Export Citation:
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Assignee:
東京エレクトロン株式会社
International Classes:
H05B33/10; B05D3/04; F26B3/04; F26B5/04; H01L51/50
Domestic Patent References:
JP2004311206A
JP2010067430A
JP2005275275A
JP6004592U
JP2002286282A
JP2007165833A
JP2011034751A
JP2005141971A
Attorney, Agent or Firm:
Kazuhiro Watanabe
Katsumi Hoshimiya
Tatsuya Josawa