静電チャック - Varian Semiconductor Equipment Associates, Inc.

Title:

静電チャック

Document Type and Number:

Japanese Patent JP6461967

Kind Code:

B2

Abstract:

An electrostatic chuck for implanting ions at high temperatures is disclosed. The electrostatic chuck includes an insulating base, with electrically conductive electrodes disposed thereon. A dielectric top layer is disposed on the electrodes. A barrier layer is disposed on the dielectric top layer so as to be between the dielectric top layer and the workpiece. This barrier layer serves to inhibit the migration of particles from the dielectric top layer to the workpiece, which is clamped on the chuck. In some embodiments, a protective layer is applied on top of the barrier layer to prevent abrasion.

Inventors:

Andrew M Wight
James Carroll

Application Number:

JP2016538951A

Publication Date:

January 30, 2019

Filing Date:

August 12, 2014

Export Citation:

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