Title:
蒸着マスク、フレーム付き蒸着マスク、有機半導体素子の製造方法、及びに有機ＥＬディスプレイの製造方法
Document Type and Number:
Japanese Patent JP6465075
Kind Code:
B2
Abstract:
There is provided a vapor deposition mask including: a resin mask including a plurality of resin mask openings corresponding to a pattern to be produced by vapor deposition; and a metal mask including a metal mask opening, the resin mask and the metal mask being stacked such that the resin mask openings overlap with the metal mask opening, wherein the metal mask includes one or a plurality of rigidity adjustment parts that partially reduce rigidity of the metal mask at a position not overlapping with the resin mask openings of the resin mask.
Inventors:
Hiroshi Kawasaki
Toshihiko Takeda
Toshihiko Takeda
Application Number:
JP2016105178A
Publication Date:
February 06, 2019
Filing Date:
May 26, 2016
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C14/04; C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
| JP2014208899A | ||||
| JP2014194062A |
Attorney, Agent or Firm:
Patent Business Corporation Intect International Patent Office
Yoshinori Ishibashi
Yoshinori Ishibashi