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Title:
水素化マグネシウム等の製造方法、水素化マグネシウムを用いた発電方法及び水素化マグネシウム等の製造装置
Document Type and Number:
Japanese Patent JP6471211
Kind Code:
B2
Abstract:
One object of the present invention is to provide a production method of magnesium hydride that is free of carbon dioxide and has high production efficiency, a power generation system that does not emit carbon dioxide or radiation using magnesium hydride, and an apparatus for producing magnesium hydride; therefore, the method for producing magnesium hydride of the present invention comprises a procedure for irradiating a magnesium compound different from magnesium hydride with hydrogen plasma, and a procedure for depositing a magnesium product containing magnesium hydride on a depositor (80) for depositing magnesium hydride disposed within the range in which hydrogen plasma is present, wherein the surface temperature of the depositor (80) is kept no more than a predetermined temperature at which magnesium hydride precipitates.

Inventors:
Riki Takizawa
Mineo Morimoto
Yuichi Sakamoto
Application Number:
JP2017227963A
Publication Date:
February 13, 2019
Filing Date:
November 28, 2017
Export Citation:
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Assignee:
S.E. Co., Ltd.
International Classes:
C01B6/04; C01B3/06; C01F5/00; H05H1/46
Domestic Patent References:
JP2016216780A
JP2010141104A
JP2002275633A
JP6005387A
JP2011032131A
JP2013023406A
Foreign References:
WO2008136087A1
Other References:
OHMI, Hiromasa, et al.,Magnesium hydride film formation using subatmospheric pressure H2 plasma at low temperature,Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processin,2016年,Vol.34, No.4,PP.04J103-1-04J103-10,ISSN:2166-2746, DOI:10.1116/1.4952705
Attorney, Agent or Firm:
Tomohiro Sakamoto
Toshihiro Oishi
Ayumi Yada