Title:
気相成長装置及びエピタキシャルウェーハの製造方法
Document Type and Number:
Japanese Patent JP6474047
Kind Code:
B2
Inventors:
Takaki Wajima
Application Number:
JP2015236871A
Publication Date:
February 27, 2019
Filing Date:
December 03, 2015
Export Citation:
Assignee:
Shin-Etsu Semiconductor Co., Ltd.
International Classes:
H01L21/205; C23C16/52; C30B25/12; H01L21/68
Domestic Patent References:
| JP2014239093A | ||||
| JP2010157629A | ||||
| JP2017069414A |
Attorney, Agent or Firm:
Ryuji Harikawa