Title:
EUV露光用ペリクル
Document Type and Number:
Japanese Patent JP6478283
Kind Code:
B2
Abstract:
There is provided a pellicle for EUV lithography, which has a filter attached to a vent hole made through a pellicle frame bar for air pressure adjustment, and this filter is designed to be heat-resistant by being made of either a metal or a ceramic material, and is adhered to the pellicle frame by weldering or soldering, and also the filter has a filtration accuracy of 0.1 through 0.3 µm.
Inventors:
Nishimura Akinori
Ryo Shirasaki
Ryo Shirasaki
Application Number:
JP2015251238A
Publication Date:
March 06, 2019
Filing Date:
December 24, 2015
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F1/64; G03F1/22
Domestic Patent References:
| JP2010256434A | ||||
| JP2005157223A | ||||
| JP2013057861A | ||||
| JP2011118263A | ||||
| JP2011123099A |
Attorney, Agent or Firm:
Yukio Numazawa