Title:
美容方法
Document Type and Number:
Japanese Patent JP6495655
Kind Code:
B2
Abstract:
The present invention provides a cosmetic method having an excellent secondary adhesion resistance effect. The cosmetic method of the present invention has a step of applying a cosmetic material on the skin, a step of pasting the base material film surface of a thin film on the skin, and a step of removing the support body of the pasted thin film, wherein the thin film consists of a base material film of the thickness of 10 to 500 nm and a support body.
Inventors:
Tomoko Kimura
Naomi Kanno
Yamaki Satoshi
Naomi Kanno
Yamaki Satoshi
Application Number:
JP2014540911A
Publication Date:
April 03, 2019
Filing Date:
October 11, 2013
Export Citation:
Assignee:
Shiseido Co., Ltd.
International Classes:
A61K8/85; A61K8/02; A61K8/73; A61Q1/10; A61Q17/04
Domestic Patent References:
| JP2012187926A | ||||
| JP2013071906A | ||||
| JP2013184970A | ||||
| JP2013001661A | ||||
| JP4810129B2 | ||||
| JP5155783A |
Foreign References:
| WO2008129707A1 | ||||
| WO2009041121A1 | ||||
| WO2012173198A1 | ||||
| WO2013153678A1 |
Other References:
Wound Repair and Regeneration,2012年 6月19日,Vol.20, No.4,p.573-579
Attorney, Agent or Firm:
Yuji Iwahashi