Title:
リソグラフィ方法及び装置
Document Type and Number:
Japanese Patent JP6510675
Kind Code:
B2
Abstract:
A method comprising illuminating a patterning device (MA′) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.
Inventors:
Baselmans, Johannes, Jacobs, Matthews
Debug, peter, bart, alois
Van Ruth, Nico
Giovanni, Component
Stars, Roland, Johannes, Wilhelms
Cowl, champurito
Downs, James, Robert
Debug, peter, bart, alois
Van Ruth, Nico
Giovanni, Component
Stars, Roland, Johannes, Wilhelms
Cowl, champurito
Downs, James, Robert
Application Number:
JP2017553313A
Publication Date:
May 08, 2019
Filing Date:
April 18, 2016
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20
Domestic Patent References:
| JP2002334831A | ||||
| JP2002250677A | ||||
| JP2007518256A | ||||
| JP2010161261A | ||||
| JP2013187539A | ||||
| JP2009200417A | ||||
| JP20099127A | ||||
| JP2006185972A |
Foreign References:
| US20020145717 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito