Title:
蒸着マスク製造方法
Document Type and Number:
Japanese Patent JP6519395
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a vapor deposition mask manufacturing method capable of suppressing the occurrence of delamination between a first metal layer and a second metal layer forming a vapor deposition mask.SOLUTION: A vapor deposition mask manufacturing method according to the present invention comprises the steps of: preparing a substrate 51 on which a predetermined conductive pattern 52 is formed; forming, on the conductive pattern 52, a first metal layer 32 provided with a first opening 30 constituting a through-hole 25 by using a first plating solution; and forming, on the first metal layer 32, a second metal layer 37 provided with a second opening 35 constituting the through-hole 25 by using a second plating solution. The first plating solution contains a first primary brightener and a first secondary brightener, and the second plating solution contains a second primary brightener and a second secondary brightener. The concentration of the second secondary brightener in the second plating solution is lower than that of the first secondary brightener in the first plating solution.SELECTED DRAWING: Figure 4
Inventors:
Ike Nagachikao
Shimazaki Hiroshi
Shimazaki Hiroshi
Application Number:
JP2015157721A
Publication Date:
May 29, 2019
Filing Date:
August 07, 2015
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C25D1/00; C23C14/04; C25D1/20; H01L51/50; H05B33/10
Domestic Patent References:
| JP2005154879A | ||||
| JP200468148A | ||||
| JP2001107283A | ||||
| JP2000355788A | ||||
| JP632078A |
Attorney, Agent or Firm:
Hiroyuki Nagai
Hirohito Katsunuma
Yukihiro Hotta
Kazuya Yamashita
Hirohito Katsunuma
Yukihiro Hotta
Kazuya Yamashita