Title:
表示装置
Document Type and Number:
Japanese Patent JP6522198
Kind Code:
B2
Abstract:
Provided is a method to manufacture a liquid crystal display device in which a contact hole for the electrical connection of the pixel electrode and one of the source and drain electrode of a transistor and a contact hole for the processing of a semiconductor layer are formed simultaneously. The method contributes to the reduction of a photography step. The transistor includes an oxide semiconductor layer where a channel formation region is formed.
Inventors:
Shunpei Yamazaki
Kaoru Hatano
Kaoru Hatano
Application Number:
JP2018075308A
Publication Date:
May 29, 2019
Filing Date:
April 10, 2018
Export Citation:
Assignee:
Semiconductor Energy Laboratory Co., Ltd.
International Classes:
G09F9/30; G02F1/1368; H01L29/786
Domestic Patent References:
| JP2010123936A | ||||
| JP2010123923A | ||||
| JP2009239276A | ||||
| JP2001066639A |
Foreign References:
| US20100105162 | ||||
| US20100099216 | ||||
| US20020074549 |