Title:
堆積プロセスにおける化学前駆体のための容器
Document Type and Number:
Japanese Patent JP6557171
Kind Code:
B2
Abstract:
Described herein are systems and methods using same for the storage and delivery of chemical precursors that are used in the manufacture of a semiconductor device. In one aspect, the storage system comprises the chemical precursors and a container and the systems have an inlet jet design. The chemical precursor has a low vapor pressure less than about 50 Torr-absolute (6.7 kPa) at container temperature set for delivery. The delivery system further contains a carrier gas. The inlet jet design can deliver the carrier gas at a certain pressure and a certain low rate to impinge upon the surface of the chemical precursors to produce a vapor or droplets of the chemical precursor. The vapor or droplets of the chemical precursor then combine with the carrier gas to provide a precursor-laden fluid stream which will be passed to and used in the processing tool.
Inventors:
James Patrick Nielsen
Charles Michael Burcher
Charles Michael Burcher
Application Number:
JP2016096078A
Publication Date:
August 07, 2019
Filing Date:
May 12, 2016
Export Citation:
Assignee:
Vertham Materials US, Limited Liability Company
International Classes:
C23C16/448; H01L21/285
Domestic Patent References:
| JP2012501543A | ||||
| JP2013165222A | ||||
| JP2012160566A |
Foreign References:
| US20050249873 |
Attorney, Agent or Firm:
Atsushi Aoki
Shinji Mitsuhashi
Naori Kota
Jun Tsuruta
Tomohiro Minamiyama
Yoichi Watanabe
Kenji Kimura
Shinji Mitsuhashi
Naori Kota
Jun Tsuruta
Tomohiro Minamiyama
Yoichi Watanabe
Kenji Kimura