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Title:
化合物、及びそれを含むネガ型感光性組成物
Document Type and Number:
Japanese Patent JP6564253
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a novel imidazole compound providing a negative type photosensitive composition capable of forming a satisfactorily cured pattern in short time, the negative type photosensitive composition containing the imidazole compound, a pattern forming method using the negative type photosensitive composition, a cured film, an insulation film and a color filter formed by using the negative type photosensitive composition, a display device having the cured film, the insulation film or the color filter.SOLUTION: An imidazole compound represented by the following formula (1) is blended with a negative type photosensitive composition. In the formula (1), Ar is a specific 6- or 5-membered aromatic group which may be substituted.SELECTED DRAWING: None

Inventors:
Shioda Dai
Tatsuro Ishikawa
Shinozaki
Application Number:
JP2015120901A
Publication Date:
August 21, 2019
Filing Date:
June 16, 2015
Export Citation:
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Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
C07D233/61; C07D409/06; C08F2/44; G02B5/20; G02F1/1333; G02F1/1335; G03F7/004; G03F7/031; G03F7/032
Domestic Patent References:
JP2015052094A
Foreign References:
US4634628
WO2008144933A1
WO2012176694A1
Other References:
Kunugi, S. et al.,Journal of the American Chemical Society,1979年,vol.101, no.13,p.3640-3646
Tonge, P. J. et al.,Biochemistry,1989年,vol.28,p.6701-6709
Huber, C. P.,Acta Crystallographica Section C: Crystal Structure Communications,1985年,vol.C41, no.7,p.1076-1079
Attorney, Agent or Firm:
Masayuki Masabayashi