Title:
化学増幅ポジ型レジスト組成物及びパターン形成方法
Document Type and Number:
Japanese Patent JP6569466
Kind Code:
B2
Abstract:
A chemically amplified positive resist composition is provided comprising a specific alkali-soluble polymer adapted to turn soluble in alkaline aqueous solution under the action of acid as base resin, an alkali-soluble polymer, and a photoacid generator in an organic solvent. The composition forms a resist film which can be briefly developed to form a pattern at a high sensitivity without generating dimples in pattern sidewalls.
Inventors:
Yoshinori Hirano
Hideyoshi Yanagisawa
Hideyoshi Yanagisawa
Application Number:
JP2015210328A
Publication Date:
September 04, 2019
Filing Date:
October 27, 2015
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/039; C08F212/14; G03F7/004; G03F7/20
Domestic Patent References:
| JP5232704A | ||||
| JP2006267475A | ||||
| JP2012163950A | ||||
| JP2014067013A | ||||
| JP11072928A |
Foreign References:
| US20050019691 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki