Title:
フレーム付き蒸着マスク、フレーム付き蒸着マスクの製造方法、フレーム付き蒸着マスク準備体、パターンの製造方法、及び有機半導体素子の製造方法
Document Type and Number:
Japanese Patent JP6569880
Kind Code:
B2
Abstract:
To provide a vapor deposition mask capable of satisfying both high definition and lightweight even in upsizing and forming a vapor deposition pattern of high definition while securing strength, a method for producing a vapor deposition mask and a vapor deposition mask preparation body capable of simply producing the vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element of high definition.SOLUTION: A metal mask 10 in which a plurality of slits 15 are provided and a resin mask 20 are stacked. Openings 25 required for composing a plurality of screens are provided in the resin mask 20. The openings 25 correspond to a pattern to be produced by vapor deposition. Each of the slits 15 is provided at a position of overlapping with the entirety of at least one screen.SELECTED DRAWING: Figure 1
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Inventors:
Toshihiko Takeda
Katsuya Obata
Hiromitsu Ochiai
Katsuya Obata
Hiromitsu Ochiai
Application Number:
JP2018079995A
Publication Date:
September 04, 2019
Filing Date:
April 18, 2018
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C14/24; C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
| JP2015165051A | ||||
| JP2013083704A | ||||
| JP2013163864A | ||||
| JP2005163099A | ||||
| JP2004190057A | ||||
| JP2005042147A | ||||
| JP2005232474A | ||||
| JP2010244917A | ||||
| JP7300664A |
Attorney, Agent or Firm:
Patent Business Corporation Intect International Patent Office
Yoshinori Ishibashi
Yoshinori Ishibashi