Title:
磁化同軸プラズマ生成装置を用いる薄膜生成装置
Document Type and Number:
Japanese Patent JP6573276
Kind Code:
B2
Inventors:
Tomohiko Asai
Hideki Nakamori
Hiratsuka master
Hideki Nakamori
Hiratsuka master
Application Number:
JP2015182857A
Publication Date:
September 11, 2019
Filing Date:
September 16, 2015
Export Citation:
Assignee:
NIHON UNIVERSITY
Nanotech Co., Ltd.
Nanotech Co., Ltd.
International Classes:
C23C14/35; C23C14/06; H05H1/46
Domestic Patent References:
| JP2014051699A | ||||
| JP2006310101A | ||||
| JP2010050090A |
Foreign References:
| WO2015002131A1 |
Attorney, Agent or Firm:
Ihei Ihei