Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
自浄式防汚性構造体および関連する製造方法
Document Type and Number:
Japanese Patent JP6607710
Kind Code:
B2
Abstract:
Apparatus for a smudge-resistant structure (100) and related fabrication methods are provided. An exemplary smudge-resistant structure (100) includes a transparent substrate (102) having a macrostructured surface (106) configured to reduce contact with the transparent substrate (102) and an oxidizing layer (120) overlying the macrostructured surface (106).

More Like This:
JP6131153An adhesive constituent for optics, an image display device, and an input/output device
JPS609859[Title of the device] Digitization table
JPH04100141TOUCH PANEL INPUT DEVICE
Inventors:
Carli Earl Therma
John F. El Schmitt
Application Number:
JP2015123565A
Publication Date:
November 20, 2019
Filing Date:
June 19, 2015
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Honeywell International Inc.
International Classes:
G06F3/041
Domestic Patent References:
JP2003114766A
JP2004263060A
JP2005149102A
JP2013018910A
JP2011032159A
JP2014071323A
JP2006239490A
JP2000016838A
JP2008096781A
JP2010096359A
Foreign References:
WO2013187506A1
US20140011013
Attorney, Agent or Firm:
Shinjiro Ono
Yasushi Kobayashi
Shigeo Takeuchi
Osamu Yamamoto
Shogo Nakamura



 
Previous Patent: 近接センサ

Next Patent: バルブ装置