Title:
ガスバリア性フィルムおよびその製造方法、並びにこれを用いた電子デバイスおよびその製造方法
Document Type and Number:
Japanese Patent JP6614136
Kind Code:
B2
Abstract:
The purpose of the present invention is to provide a gas barrier film which is capable of simplifying a step for removing an adhesive remaining after the removal of a protective film (50). A gas barrier film (201) which comprises: a base (55); a gas barrier layer (52) that is arranged on one surface of the base (55); and a protective film (50) that is arranged on the gas barrier layer (52) with an adhesive layer (51) being interposed therebetween. The gas barrier layer (52) is formed by modifying a coating film, which is obtained by applying a coating liquid containing a polysilazane onto the base (55) and drying the applied coating liquid, by irradiating the coating film with an active energy ray. The C/Si elemental abundance ratio in the most surficial portion of the gas barrier layer (52) is 1.5 or less as measured in a state where the protective film (55) is separated therefrom.
Inventors:
Reiko Obuchi
Application Number:
JP2016511966A
Publication Date:
December 04, 2019
Filing Date:
March 31, 2015
Export Citation:
Assignee:
Konica Minolta Co., Ltd.
International Classes:
B32B9/00; B32B27/00; C08J7/04; H05B33/02
Domestic Patent References:
| JP2012067193A | ||||
| JP2013123895A | ||||
| JP2013226758A | ||||
| JP2013233716A |
Foreign References:
| WO2011007543A1 | ||||
| WO2014007277A1 | ||||
| WO2012014653A1 | ||||
| WO2007138837A1 |
Attorney, Agent or Firm:
Hatta International Patent Corporation