Title:
露光装置
Document Type and Number:
Japanese Patent JP6620208
Kind Code:
B2
Abstract:
An exposure apparatus arranged to project a radiation beam onto a target portion of a substrate, the exposure apparatus having: a first substrate holder configured to hold the substrate; a second substrate holder configured to hold the substrate; a sensor holder configured to hold a sensor and/or detector; a first measurement device having a first alignment system having an alignment sensor configured to measure positions of a substrate alignment mark on the substrate; a second measurement device having a second alignment system having a further alignment sensor configured to measure positions of the substrate alignment mark on the substrate; a first scale arranged on a lower surface of the first substrate holder; and a first encoder head arranged to cooperate with the first scale, the first encoder head located beneath the first alignment system and held by a stationary support.
Inventors:
Junichi Kanehara
Application Number:
JP2018205284A
Publication Date:
December 11, 2019
Filing Date:
October 31, 2018
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F9/00; G03F7/20; H01L21/683
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Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito