Title:
マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法
Document Type and Number:
Japanese Patent JP6621626
Kind Code:
B2
Abstract:
According to the present invention, provided is a mask blank (10), in which: a light shielding film (4) has a single layer structure or a laminate structure of a plurality of layers; at least one layer of the light shielding film (4) is formed of a material which contains a transition metal and silicon and is free from nitrogen and oxygen, or a material which contains a transition metal, silicon, and nitrogen and satisfies a condition of the following expression (1); a phase shift film (2) has a surface layer and a layer other than the surface layer; and the layer other than the surface layer is formed of a material which contains a transition metal, silicon, nitrogen, and oxygen, has a content of oxygen of 3 atom % or more, and satisfies a condition of the following expression (A).CN≤9.0×10−6×RM4−1.65×10−4×RM3−7.718×10−2×RM2+3.611×RM−21.084 Expression (1)0.04×AS−0.06×AM>1 Expression (A)
Inventors:
Atsushi Kominato
Hiroshi Shishido
Takashi Uchida
Hiroshi Shishido
Takashi Uchida
Application Number:
JP2015185779A
Publication Date:
December 18, 2019
Filing Date:
September 18, 2015
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/32; G03F1/58
Domestic Patent References:
| JP2012058593A | ||||
| JP2007241065A | ||||
| JP2012113297A |
Foreign References:
| WO2009123172A1 | ||||
| WO2014112457A1 | ||||
| WO2015141078A1 |
Attorney, Agent or Firm:
Yasuo Fujimura