Title:
フォトリソグラフィのためのオーバーコート組成物及び方法
Document Type and Number:
Japanese Patent JP6641419
Kind Code:
B2
Abstract:
Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
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Inventors:
Chan-Yong Hong
Lee-Hyun Ryu
Min-Kyun Jiang
Don-Young Kim
Jae Yoon An
Lee-Hyun Ryu
Min-Kyun Jiang
Don-Young Kim
Jae Yoon An
Application Number:
JP2018111140A
Publication Date:
February 05, 2020
Filing Date:
June 11, 2018
Export Citation:
Assignee:
Rohm and Haas Electronic Materials Korea Limited
International Classes:
G03F7/11; C08F220/28; G03F7/20; H01L21/027
Domestic Patent References:
| JP2014056194A | ||||
| JP2001330957A |
Foreign References:
| US20080311506 | ||||
| CN104536267A |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office