Title:
樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6664932
Kind Code:
B2
Abstract:
A compound represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C5 to C18 hydrocarbon group consisting of the following groups (a) and (b): (a) a liner or branched divalent hydrocarbon group and (b) an alicyclic hydrocarbon group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, A1 represents a single bond, a C1 to C6 alkanediyl group or *-A2-X1-(A3-X2)a-(A4)b-, * represents a binding site to an oxygen atom, A2, A3 and A4 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, a represents 0 or 1, and b represents 0 or 1.
Inventors:
Tatsuro Masuyama
Suzuki Yuki
Koji Ichikawa
Suzuki Yuki
Koji Ichikawa
Application Number:
JP2015217358A
Publication Date:
March 13, 2020
Filing Date:
November 05, 2015
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08F20/28; C07C69/675; G03F7/038; G03F7/039
Domestic Patent References:
| JP2004101934A | ||||
| JP2011132273A | ||||
| JP2014112208A | ||||
| JP2013041265A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation